13^th International Symposium on High Current Electronics (2004)

• INTENSE ELECTRON AND ION BEAMS
• PULSED POWER TECHNOLOGY
• HIGH POWER MICROWAVES
• PINCHES, PLASMA FOCUS AND CAPILLARY DISCHARGE
• PULSED POWER APPLICATIONS

7^th International Conference on Modification of Materials with Particle Beams and Plasma Flows (2004)

• BEAM AND PLASMA SOURCES
1. Sources of Broad and Ribbon Ion Beams with Grid-Bounded Plasma Cathode and Magnetic Trap
   N.V. Gavrilov
2. Electron Source for Producing Radial Converging Electron Beam
   V.I. Engelko, V.S. Kuznetsov, V.O. Kuryshev, G. Mueller, and G.A. Vyazmenova
3. Investigation of Plasma Filter Influence on Ions Charge State of DC Vacuum Arc Plasma
   A.A. Sinebryukhov, S.V. Dektyarev, A.I. Ryabchikov, I.B. Stepanov
4. Pulsed Electron-Beam Facility with Improved Purity of the Treatment Process
   G.E. Ozur, D.I. Proskurovsky, and K.V. Karlik
5. Plasma Immersion Ion Implantation System Based on Glow Discharge with Electrostatic Confinement of Electrons
   A.S. Metel
6. Universal Sources of Accelerated Particles and Metal Vapor for Industrial-Scale Beam-Assisted Deposition
   S.N. Grigoriev, A.N. Isaikov, Yu.A. Melnik, A.S. Metel
7. Kiloelectronvolt Centimeter Profile Ion Beam Formation from Hollow Cathode Discharge in Conditions without Grid Stabilization of Emitting Plasma Surface
   A.P. Semenov
8. Victoria Plant Design
   A.M. Smyslov, U.M. Dyblenko, M.K. Smyslova, P.V. Beglikcheev
9. Installation for Treatment of Metal Surfaces by Low Energy Electron Beam
   V.N. Devjatkov, N.N. Koval, P.M. Schanin, V.S. Tolkachev, L.G. Vintizenko
10. Vils-5 Vacuum Ion Beam System for Technological Use
    V.P. Yanovskiy, V.P. Sergeev, Yu.N. Paraev, D.V. Kozlov, S.A. Zhuravlev
11. A Cathode Unit for High-Dose Implantation of Semiconductor Materials
    B.P. Gritsenko, V.V. Bespalov
12. Comparative Parameters of Reflective Discharges with Two Types of Self-Heating Cathodes
    L.A. Zjulkova, A.V. Kozyrev, D.I. Proskurovsky, V.A. Kagadei
13. Formation of Ribbon Plasma Emitter of Ions in Gas Discharge System with Grid-Bounded Plasma Cathode1
    N.V. Gavrilov, O.A. Bureyev
14. A Broad Beam Ion Source with a Grid-Bounded Plasma
    N.V. Gavrilov, A.S. Kamenetskikh
15. Formation of Low-Energy Ion Flows in Modified Penning System with Nonequipotential Cathode
    S.P. Nikulin, D.F. Chichigin, P.V. Tretnikov
16. Lifetime of Vacuum Arc Triggering System Based on Surface Discharge
    A.G. Nikolaev, E.M. Oks, and K.P. Savkin
17. Generation of Gas-Discharge Plasma by an Arc Source with a Cold Hollow Cathode1
    Yu.Kh. Akhmadeev, P.M. Schanin, N.N. Koval
18. Theoretical Calculation of Electron Energy Distribution Function in Crossed E—B Fields in Low-Pressure Argon Plasma1
    D.S. Vershinin, A.V. Kozyrev
19. Microcontroller Based Multi-Purpose Power Supply for Thin Films Deposition Technologies
    I.R. Arslanov, A.V. Mikov, V.G. Podkovirov, N.S. Sochugov
20. Effective Source of High Purity Gaseous Plasma
    A.V. Vizir, M.V. Shandrikov, G.Yu. Yushkov, E.M. Oks
21. Installation for Hard Carbon Films Deposition on Large Area Substrates
    N.S. Sochugov, A.A. Soloviev, S.V. Rabotkin, I.R. Arslanov, K.V. Oskomov, V.G. Podkovyrov, and N.F. Kovsharov
22. Arc Generator with a Combined Filament and Hollow Cathode for Plasma Generation in a Large Volume
    V.V. Shugurov, N.N. Koval, L.G. Vintizenko, V.S. Tolkachev, V.V. Pesterev, D.V. Krivonosenko
23. Investigation of Filament Operating Mode within E—H Fields
    D.A. Kotov
24. Study of Features of Magnetron Discharge Stimulating by Intensive Ion Beam
    D.A. Kotov, S.M. Zavatskiy, A.P. Dostanko, A.L. Salavei
25. Program-Controlled High-Voltage Pulse Generator for Ion Beams Source
    S.V. Dektyarev
26. Technological Wide-Aperture Source of Gas Ions
    Yu.N. Paraev, V.P. Yanovskii
27. High-Current Low-Pressure Pulsed Glow Discharge with a Hollow Cathode1
    Yu.D. Korolev, O.B. Frants, V.G. Geyman, R.V. Ivashov, N.V. Landl, I.A. Shemyakin, K. Frank, I. Petzenhauser
28. Regularities of the Dynamic Stark Effect for Rare Gases in a High-Frequency Discharge1
    E.V. Koryukina
29. Ion Beam Time-of-Flight Mass-to-Charge Analyzer for Ion Implantation Facility1
    V.I. Gushenets, A.G. Nikolaev, L.G. Vintizenko, E.M. Oks, G.Yu. Yushkov, A. Oztarhan, and I.G. Brown
• FUNDAMENTALS OF MODIFICATION PROCESSES
• MODIFICATION OF MATERIAL PROPERTIES
• COATING DEPOSITION
• DIAGNOSTICS OF MODIFIED MATERIALS