SCIENTIFIC AND ORGANIZATION STRUCTURE
LABORATORY OF PLASMA EMISSION ELECTRONICS
The Laboratory of plasma emission electronics belongs to the similarly entitled Department organized in 1977 under the direction of Prof. Yu.E. Kreindel' at once the Institute of High Current Electronics was established. Until May of 2001, P.M. Schanin headed the laboratory. At present time, directed by N.N. Koval', the laboratory personnel consists of 15, including 2 Doctors of Science, 1 Candidate of Science, 3 researchers, 3 post-graduates, a chief designer, an engineer and technicians.
- Study on structure and emission characteristics of high-current gas discharges and creation on their base of charged particles efficient sources with plasma emitters.
- Development of physical fundamentals of equipment and techniques in the field of vacuum electron and ion plasma surface modification of materials and products.
Basic scientific achievements
On the basis of experimental study on vacuum and high current gas discharges, the uniform emission structures with plasma boundary mesh holding at the area from 1 cm2 up to 1 m2, at electron emission current density of 10-2 to 102 A/cm2, current pulse duration of 10-6 to 10-3 s, and pulse repetition rate of 1 to 103 s-1 have been suggested and created.
On the base of electron plasma emitters there was developed, manufactured and investigated: efficient sources of low-energy (up to 20 keV) high-current (up to 1 kA) microsecond (up to 100 ms) electron beams with current density of high-speed electrons up to 100 A/cm2; electron accelerators producing electron beams in air of great cross-section (up to 1 m2) with independent control of electron energy (50¸300 keV), amplitude (up to 1 kA), duration (10-5-10-3s) and pulsed repetition rate (up to 50 s-1).
The created sources and electron accelerators were successfully employed for material surface modification and obtaining of laser radiation under excitation of gas mixtures.
A method of energy-efficient generation of dense uniform plasma in big volumes (up to 1 m3) using stationary low-pressure arc discharges with hollow cathode and anode has been also proposed and realized. On this basis a number of technological set-ups used for vacuum ion-plasma surface treatment of materials and products have been produced.
Innovative vacuum electron-ion-plasma technological processes for surface modification of steels and alloys allowing to essentially modification of physical-chemical properties and operating characteristics of machinery parts and instruments have been developed.
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